Hydrophilic Antireflection and Antidust Silica Coatings
We report on the optical and morphological properties of silica thin layers deposited by reactive RF magnetron sputtering of a SiO2 target under different oxygen to total flow ratios [r(O2) = O2/Ar, ranging from 0 to 25%]. The refractive index (n), extinction coefficient, total transmission, and total reflectance were systematically investigated, while field-emission scanning electron microscopy, atomic force microscopy, and three-dimensional (3D) average roughness data construction measurements were carried out to probe the surface morphology. Contact angle measurements were performed to assess the hydrophilicity of our coatings as a function of the oxygen content. We performed a thorough numerical analysis using 1D-solar cell capacitance simulator (SCAPS-1D) based on the measured experimental optical properties to simulate the photovoltaic (PV) device performance, where a clear improvement in the photoconversion efficiency from 25 to 26.5% was clearly observed with respect to r(O2). Finally, a computational analysis using OptiLayer confirmed a minimum total reflectance of less than 0.4% by coupling a silica layer with n = 1.415 with another high-refractive-index (i.e., >2) oxide layer. These promising results pave the way for optimization of silica thin films as efficient antireflection and self-cleaning coatings to display better PV performance in a variety of locations including a desert environment.
Other Information
Published in: ACS Omega
License: https://creativecommons.org/licenses/by-nc-nd/4.0/
See article on publisher's website: https://dx.doi.org/10.1021/acsomega.0c05405
Funding
Open Access funding provided by the Qatar National Library.
History
Language
- English
Publisher
American Chemical SocietyPublication Year
- 2021
License statement
This Item is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.Institution affiliated with
- Hamad Bin Khalifa University
- Qatar Environment and Energy Research Institute - HBKU